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晶體生長手冊5:晶體生長模型及缺陷表征

晶體生長手冊5:晶體生長模型及缺陷表征

定 價:¥76.00

作 者: (美)德哈納拉 等主編
出版社: 哈爾濱工業(yè)大學出版社
叢編項:
標 簽: 晶體學 科學與自然

ISBN: 9787560338705 出版時間: 2013-01-01 包裝: 平裝
開本: 16開 頁數(shù): 367 字數(shù):  

內(nèi)容簡介

  《Springer手冊精選系列·晶體生長手冊(第5冊):晶體生長模型及缺陷表征(影印版)》介紹了生長工藝和缺陷形成的模型。這些章節(jié)驗證了工藝參數(shù)和產(chǎn)生晶體質(zhì)量問題包括缺陷形成的直接相互作用關(guān)系。隨后的PartG展示了結(jié)晶材料特性和分析的發(fā)展。PartF和G說明了預(yù)測工具和分析技術(shù)在幫助高質(zhì)量的大尺寸晶體生長工藝的設(shè)計和控制方面是非常好用的。

作者簡介

  Govindhan Dhanaraj is the Manager of Crystal Growth Technologies at Advanced Renewable Energy Company (ARC Energy) at Nashua, New Hampshire (USA) focusing on the growth of large size sapphire crystals for LED lighting applications, characterization and related crystal growth furnace development. He received his PhD from the Indian Institute of Science, Bangalore and his Master of Science from Anna University (India). Immediately after his doctoral degree, Dr. Dhanaraj joined a National Laboratory, presently known as Rajaramanna Center for Advanced Technology in India, where he established an advanced Crystal Growth Laboratory for the growth of optical and laser crystals. Prior to joining ARC Energy, Dr. Dhanaraj served as a Research Professor at the Department of Materials Science and Engineering, Stony Brook University, NY, and also held a position of Research Assistant Professor at Hampton University, VA. During his 25 years of focused expertise in crystal growth research, he has developed optical, laser and semiconductor bulk crystals and SiC epitaxial films using solution, flux, Czochralski, Bridgeman, gel and vapor methods, and characterized them using x-ray topography, synchrotron topography, chemical etching and optical and atomic force microscopic techniques. He co-organized a symposium on Industrial Crystal Growth under the 17th American Conference on Crystal Growth and Epitaxy in conjunction with the 14th US Biennial Workshop on Organometallic Vapor Phase Epitaxy held at Lake Geneva, WIin 2009. Dr. Dhanaraj has delivered invited lectures and also served as session chairman in many crystal growth and materials science meetings. He has published over 100 papers and his research articles have attracted over 250 rich citations.

圖書目錄

縮略語
PartF 晶體生長及缺陷模型
36 熔體生長晶體體材料的傳導(dǎo)和控制
36.1 運輸過程的物理定律
36.2 熔體的流動結(jié)構(gòu)
36.3 外力對流動的控制
36.4 前景
參考文獻

37 Ⅲ族氮化物的氣相生長
37.1 Ⅲ族氮化物的氣相生長概述
37.2 AIN/GaN氣相淀積的數(shù)學模型
37.3 氣相淀積AIN/GaN的表征
37.4 GaN的IVPE生長模型——個案研究
37.5 氣相GaN/AIN膜生長的表面形成
37.6 結(jié)語
參考文獻

38 生長直拉硅晶體中連續(xù)尺寸量子缺陷動力學
38.1 微缺陷的發(fā)現(xiàn)
38.2 無雜質(zhì)時的缺陷動力學
38.3 有氧時的直拉缺陷動力學
38.4 有氮時的直拉缺陷動力學
38.5 直拉硅單晶中空位的橫向合并
38.6 結(jié)論
參考文獻

39 熔體基底化合物晶體生長中應(yīng)力和位錯產(chǎn)生的模型
39.1 綜述
39.2 晶體生長過程
39.3 半導(dǎo)體材料的位錯分布
39.4 位錯產(chǎn)生的模型
39.5 晶體的金剛石結(jié)構(gòu)
39.6 半導(dǎo)體的變形特性
39.7 Haasen模型對晶體生長的應(yīng)用
39.8 替代模式
39.9 模型概述和數(shù)值實現(xiàn)
39.1 0數(shù)值結(jié)果
39.1 1總結(jié)
參考文獻

40 BS和EFG系統(tǒng)中的質(zhì)量和熱量傳輸
40.1 雜質(zhì)分布的基預(yù)測模型——垂直BS系統(tǒng)
40.2 雜質(zhì)分布的基預(yù)測模型-EFG系統(tǒng)
參考文獻

PartG 缺陷表征及技術(shù)
41晶體層結(jié)構(gòu)的X射線衍射表征
41.1 X射線衍射
41.2 層結(jié)構(gòu)的基本直接X射線衍射分析
41.3 設(shè)備和理論思考
41.4 從低到高的復(fù)雜性分析實例
41.5 快速分析
41.6 薄膜微映射
41.7 展望
參考文獻

42 晶體缺陷表征的X射線形貌技術(shù)
42.1 X射線形貌的基本原則
42.2 X射線形貌技術(shù)的發(fā)展歷史
42.3 X射線形貌技術(shù)和幾何學
42.4 X射線形貌技術(shù)理論背景
42.5 X射線形貌上缺陷的對比原理
42.6 X射線形貌上的缺陷分析
42.7 目前的應(yīng)用狀況和發(fā)展
參考文獻
……
43 半導(dǎo)體的缺陷選擇性刻蝕
44 晶體的透射電子顯微鏡表征
45 點缺陷的電子自旋共振表征
46 半導(dǎo)體缺陷特性的正電子湮沒光譜表征

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