PREFACE A NOTE TO INSTRUCTORS ABOUT THE AUTHOR NOTATIONAL CONVENTIONS Chapter 1 Introduction 1.0 Preview 1.1 The History of MEMS Development 1.2 The Intrinsic Characteristics of MEMS 1.2.1 Miniaturization 1.2.2 Microelectronics Integration 1.2.3 Mass Fabrication with Precision
1.3 Devices: Sensors and Actuators 1.3.1 Energy Domains and Transducers 1.3.2 Sensors 1.3.3 Actuators Summary Problems References
Chapter 2 Introduction to Microfabrication 2.0 Preview 2.1 Overview of Microfabrication 2.2 The Microelectronics Fabrication Process 2.3 Silicon-Based MEMS Processes 2.4 New Materials and Fabrication Processes 2.5 Points of Consideration for Processing Summary Problems References
Chapter 3 Review of Essential Electrical and Mechanical Concepts 3.0 Preview 3.1 Conductivity of Semiconductors 3.1.1 Semiconductor Materials 3.1.2 Calculation of Charge Carrier Concentration 3.1.3 Conductivity and Resistivity
3.2 Crystal Planes and Orientation 3.3 Stress and Strain 3.3.1 Internal Force Analysis: Newton's Laws of Motion 3.3.2 Definitions of Stress and Strain 3.3.3 General Scalar Relation Between Tensile Stress and Strain 3.3.4 Mechanical Properties of Silicon and Related Thin Films 3.3.5 General Stress-Strain Relations
3.4 Flexural Beam Bending Analysis Under Simple Loading Conditions 3.4.1 Types of Beams 3.4.2 Longitudinal Strain Under Pure Bending 3.4.3 Deflection of Beams 3.4.4 Finding the Spring Constants
3.5 Torsional Deflections 3.6 Intrinsic Stress 3.7 Resonant Frequency and Quality Factor 3.8 Active Tuning of the Spring Constant and Resonant Frequency 3.9 A List of Suggested Courses and Books Summary Problems References
Chapter 4 Electrostatic Sensing and Actuation 4.0 Preview 103 4.1 Introduction to Electrostatic Sensors and Actuators 4.2 Parallel-Plate Capacitors 4.2.1 Capacitance of Parallel Plates 4.2.2 Equilibrium Position of Electrostatic Actuator Under Bias 4.2.3 Pull-In Effect of Parallel-Plate Actuators